THE INFLUENCE OF THE SUBSTRATE MATERIAL ON THE GROWTH OF V2O5 FLASH-EVAPORATED FILMS

Authors
JULIEN C GUESDON JP GORENSTEIN A KHELFA A IVANOV I
Citation
C. Julien et al., THE INFLUENCE OF THE SUBSTRATE MATERIAL ON THE GROWTH OF V2O5 FLASH-EVAPORATED FILMS, Applied surface science, 90(3), 1995, pp. 389-391
Citations number
8
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical","Materials Science, Coatings & Films
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
90
Issue
3
Year of publication
1995
Pages
389 - 391
Database
ISI
SICI code
0169-4332(1995)90:3<389:TIOTSM>2.0.ZU;2-4
Abstract
The influence of the substrate material on the growth of V2O5 flash-ev aporated films has been studied by Raman scattering spectroscopy. The highest quality films were grown on silicon substrate maintained at 25 degrees C and annealed at 450 degrees C in Ar atmosphere.