COPPER THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION FROM COPPER(II) ACETYLACETONATE

Authors
MARUYAMA T SHIRAI T
Citation
T. Maruyama et T. Shirai, COPPER THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION FROM COPPER(II) ACETYLACETONATE, Journal of Materials Science, 30(21), 1995, pp. 5551-5553
Citations number
9
Categorie Soggetti
Material Science
Journal title
Journal of Materials Science → ACNP
ISSN journal
00222461
Volume
30
Issue
21
Year of publication
1995
Pages
5551 - 5553
Database
ISI
SICI code
0022-2461(1995)30:21<5551:CTPBCF>2.0.ZU;2-6
Abstract
Copper thin films were prepared by a low-temperature atmospheric press ure chemical vapour deposition method. The raw material was copper (ii ) acetylacetonate. At a reaction temperature above 220 degrees C, poly crystalline copper films can be obtained by hydrogen reduction of the raw material. The resistivity of the film was close to that for bulk c opper.