PATTERNED METAL ELECTRODEPOSITION USING AN ALKANETHIOLATE MASK

Authors
Citation
Tp. Moffat et H. Yang, PATTERNED METAL ELECTRODEPOSITION USING AN ALKANETHIOLATE MASK, Journal of the Electrochemical Society, 142(11), 1995, pp. 220-222
Citations number
41
Categorie Soggetti
Electrochemistry
ISSN journal
00134651
Volume
142
Issue
11
Year of publication
1995
Pages
220 - 222
Database
ISI
SICI code
0013-4651(1995)142:11<220:PMEUAA>2.0.ZU;2-3
Abstract
Alkanethiolate films were used as templates for patterned electrodepos ition of metal structures with micrometer dimensions. Two patterning s chemes were implemented, contact printing of a C16H33SH film and mecha nical scribing micrometer wide grooves in a self-assembled C16H33SH mo nolayer film. A thin film of nickel was then electrodeposited on film- free areas of the copper and gold substrates. The alkanethiolate templ ate can also be used as a mask for chemical etching. This was demonstr ated by etching C16H33SH patterned copper substrates. More complex str uctures can be built by combining both deposition and etching processe s.