Tp. Moffat et H. Yang, PATTERNED METAL ELECTRODEPOSITION USING AN ALKANETHIOLATE MASK, Journal of the Electrochemical Society, 142(11), 1995, pp. 220-222
Alkanethiolate films were used as templates for patterned electrodepos
ition of metal structures with micrometer dimensions. Two patterning s
chemes were implemented, contact printing of a C16H33SH film and mecha
nical scribing micrometer wide grooves in a self-assembled C16H33SH mo
nolayer film. A thin film of nickel was then electrodeposited on film-
free areas of the copper and gold substrates. The alkanethiolate templ
ate can also be used as a mask for chemical etching. This was demonstr
ated by etching C16H33SH patterned copper substrates. More complex str
uctures can be built by combining both deposition and etching processe
s.