Oa. Ashiru et Jpg. Farr, APPLICATION OF FREQUENCY-RESPONSE ANALYSIS TO THE DETERMINATION OF CATHODIC DISCHARGE MECHANISM DURING SILVER ELECTROPLATING, Journal of the Electrochemical Society, 142(11), 1995, pp. 3729-3734
The ac impedance data generated from the frequency response analysis t
echnique were used to establish the mechanism of silver electroplating
from the industrial cyanide plating bath. The deposition process invo
lves parallel and concurrent charge-transfer reactions from more than
one silver complex. Depending on the cyanide concentration in the silv
er plating bath, the electrode reaction seems to proceed mostly throug
h one of the silver species/complexes: AgCN, Ag(CN)(2)(-), or Ag(CN)(3
)(2-), which are in equilibrium with each other. The discharge of Ag(C
N)(2)(-) complex appears the predominant process, especially for bath
concentrations in the range of commercial silver cyanide plating syste
ms. The complex plane ac impedance diagrams of the plating system, at
steady state, consist of two capacitive loops at the lower frequencies
, preceded by a high frequency spectrum which corresponds to the farad
aic charge-transfer process. The lower frequency features are a manife
station of the surface adsorption and coverage processes by specific i
ntermediate species like cyanide and carbonate ions in the plating bat
h.