Tj. Suleski et Dc. Oshea, GRAY-SCALE MASKS FOR DIFFRACTIVE-OPTICS FABRICATION .1. COMMERCIAL SLIDE IMAGERS, Applied optics, 34(32), 1995, pp. 7507-7517
Fabrication of diffractive optics with binary masks requires multiple
photolithographic processes to produce high-efficiency elements. Align
ment or etching errors at any stage of fabrication decrease the effici
ency of the element. We developed an easily accessible procedure that
reduces fabrication complexity and costs by using a single gray-scale
mask. The gray-scale patterns are generated by commercial slide imager
s and are then photoreduced onto low-contrast film plates. Multiple-le
vel or continuous relief structures (kinoforms) may be constructed by
use of the photoreduced gray-scale patterns as lithographic masks. Dif
fractive-optic lenses and blazed gratings were fabricated in photoresi
st with this procedure. First-order diffraction efficiencies as high a
s 85% were measured for the blazed gratings. The advantages and the li
mitations of this technique are discussed.