GRAY-SCALE MASKS FOR DIFFRACTIVE-OPTICS FABRICATION .2. SPATIALLY FILTERED HALF-TONE SCREENS

Citation
Dc. Oshea et Ws. Rockward, GRAY-SCALE MASKS FOR DIFFRACTIVE-OPTICS FABRICATION .2. SPATIALLY FILTERED HALF-TONE SCREENS, Applied optics, 34(32), 1995, pp. 7518-7526
Citations number
22
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
34
Issue
32
Year of publication
1995
Pages
7518 - 7526
Database
ISI
SICI code
0003-6935(1995)34:32<7518:GMFDF.>2.0.ZU;2-D
Abstract
Fabrication of diffractive optics with binary masks requires multiple photolithographic processes to produce efficient, continuous profile e lements (kinoforms). Alignment or etching errors at any stage of fabri cation decrease the efficiency of the element. We developed two access ible procedures that minimize fabrication complexity, component turnar ound time, and cost. The first technique [Appl. Opt. 34, 7507-7517 (19 95)] uses gray-scale masks produced by commercial slide-imager systems . Here, we report on an alternative technique for producing gray-scale masks by spatial filtering of halftone screens. Using the photoreduce d gray-scale patterns as lithographic masks, we fabricated diffractive -optic blazed gratings and lens arrays in both photoresist and quartz. First-order efficiencies as high as 70% are reported. Also, the stren gths and limitations of this technique are compared with the previousl y reported slide-imager method as well as other fabrication methods.