MATCHING THE RESISTIVITY OF SI-NB THIN-FILM THERMOMETERS TO THE EXPERIMENTAL TEMPERATURE-RANGE

Citation
D. Devecchio et al., MATCHING THE RESISTIVITY OF SI-NB THIN-FILM THERMOMETERS TO THE EXPERIMENTAL TEMPERATURE-RANGE, Review of scientific instruments, 66(11), 1995, pp. 5367-5368
Citations number
13
Categorie Soggetti
Physics, Applied","Instument & Instrumentation
ISSN journal
00346748
Volume
66
Issue
11
Year of publication
1995
Pages
5367 - 5368
Database
ISI
SICI code
0034-6748(1995)66:11<5367:MTROST>2.0.ZU;2-1
Abstract
The useful temperature range of semiconducting resistive thermometers is limited by declining sensitivity at high temperature and inconvenie ntly high resistivity at low temperatures. The useful temperature rang e of sputtered thin film Si:Nb resistance thermometers is controlled b y the Nb concentration. We have developed a simple technique for contr olling the Nb concentration during the fabrication process. We describ e an extremely sensitive family of thermometers with useful temperatur e ranges that overlap and span temperatures from below 1 K to above 45 0 K. (C) 1995 American Institute of Physics.