NUMERICAL SIMULATIONS OF ROUGHENING TEMPERATURES IN A HEXAGONAL VAN-DER-WAALS HE-4 CRYSTAL

Citation
Sg. Lipson et al., NUMERICAL SIMULATIONS OF ROUGHENING TEMPERATURES IN A HEXAGONAL VAN-DER-WAALS HE-4 CRYSTAL, Journal of low temperature physics, 101(3-4), 1995, pp. 683-688
Citations number
11
Categorie Soggetti
Physics, Applied
ISSN journal
00222291
Volume
101
Issue
3-4
Year of publication
1995
Pages
683 - 688
Database
ISI
SICI code
0022-2291(1995)101:3-4<683:NSORTI>2.0.ZU;2-V
Abstract
We have carried out numerical simulations to investigate roughening on He-4 crystal surfaces. Algorithms were constructed for an h.c.p, crys tal, incorporating van-der-Waals interatomic interactions. The Wulff p lot was calculated at 0 K. Also, by sectioning the crystal in several symmetry directions, roughening temperatures, T-R, have been calculate d for these orientations using a lattice-gas model. In particular, the se have been determined for the c, a and s facets, as well as for lowe r-symmetry facets which involve interactions between higher-than-neare st-neighbours. On one of these facets, we have observed the formation of anisotropic clusters below a certain critical temperature. The valv es for the high-symmetry facets are more precise but in broad agreemen t with those calculated by Touzani and Wortis(1) and do not agree part icularly well with the observed valves. We are therefore investigating quantum corrections to the calculations.