CONFIGURATION AND CRYSTALLIZATION OF A-C-H FILM ON GE AND SI SUBSTRATES

Citation
Zy. Liu et al., CONFIGURATION AND CRYSTALLIZATION OF A-C-H FILM ON GE AND SI SUBSTRATES, Journal of Materials Science, 28(19), 1993, pp. 5313-5316
Citations number
7
Categorie Soggetti
Material Science
ISSN journal
00222461
Volume
28
Issue
19
Year of publication
1993
Pages
5313 - 5316
Database
ISI
SICI code
0022-2461(1993)28:19<5313:CACOAF>2.0.ZU;2-T
Abstract
Infrared and Raman analyses on the configuration of hydrogenated amorp hous carbon (a-C:H) thin films on monocrystalline Ge and Si substrates have been carried out. Models of the short range order and of the non -equilibrium crystallization aggregation of the films are proposed bas ed on the analysis results and previous works by Smith [1, 2], Lu and Wang [3] and Witten and Sander [4]. The computer simulated aggregates, according to the models, are fractals with the dimension 1.81 +/- 0.0 6. The films have been crystallized by laser illustration quenching. T he fractal dimension of the experimentally obtained aggregates is in a greement with the simulation result.