NICKEL THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION FROM NICKEL ACETYLACETONATE

Authors
MARUYAMA T TAGO T
Citation
T. Maruyama et T. Tago, NICKEL THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION FROM NICKEL ACETYLACETONATE, Journal of Materials Science, 28(19), 1993, pp. 5345-5348
Citations number
6
Categorie Soggetti
Material Science
Journal title
Journal of Materials Science → ACNP
ISSN journal
00222461
Volume
28
Issue
19
Year of publication
1993
Pages
5345 - 5348
Database
ISI
SICI code
0022-2461(1993)28:19<5345:NTPBCF>2.0.ZU;2-B
Abstract
Nickel thin films were prepared by a low-temperature atmospheric-press ure chemical vapour deposition method. The raw material was nickel ace tylacetonate. At a reaction temperature above 250-degrees-C, polycryst alline nickel films can be obtained by hydrogen reduction of the raw m aterial. The resistivity (8.1-13.3 muOMEGA cm) of the film was close t o that of bulk nickel.