ELECTRICAL CHARACTERIZATION OF NEUTRON-IRRADIATION INDUCED DEFECTS INUNDOPED EPITAXIALLY GROWN N-GAAS

Citation
Fd. Auret et al., ELECTRICAL CHARACTERIZATION OF NEUTRON-IRRADIATION INDUCED DEFECTS INUNDOPED EPITAXIALLY GROWN N-GAAS, Journal of applied physics, 74(7), 1993, pp. 4339-4342
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
74
Issue
7
Year of publication
1993
Pages
4339 - 4342
Database
ISI
SICI code
0021-8979(1993)74:7<4339:ECONID>2.0.ZU;2-5
Abstract
Undoped n-GaAs, grown by organometallic vapor phase epitaxy, was irrad iated with neutrons from a clinical p(66)/Be(40) source for a range of fluences. Deep level transient spectroscopy (DLTS), employing Pd Scho ttky barrier diodes, indicated that four electron traps, En1, En2, En4 , and En5, with energy levels at 0.04, 0.14, 0.36, and 0.66 eV, respec tively, below the conduction band were created during neutron radiatio n. Their introduction rates varied from 1 cm-1 for the En1 to 11 cm-1 for the En5. It was found that the En1, En2, and En4 defects have DLTS ''signatures'' similar to the E1, E2, and E3 point defects introduced during high energy electron irradiation, indicating their point defec t nature. The En5 has a very large capture cross section, its emission rate exhibits a strong electric field dependence, and there are indic ations that it has a band-like energy.distribution, that results in a broad DLTS peak. We speculate that this trap is related to the presenc e of extended defects in the neutron irradiated GaAs.