Epitaxial growth of Fe(211) was achieved at a room temperature on MgO(
110) with a dc facing targets sputtering system. The epitaxial relatio
n was confirmed by electron diffraction: [111] in the Fe(211) plane is
parallel to [110] in the MgO(110) plane with a 6:5 coincident site la
ttice. Crystallographic and magnetic properties could be controlled by
changing the rf power of substrate bias and substrate temperature. Th
e magnetocrystalline anisotropy energy for Fe(211) was calculated and
compared with experimental results. The film deposited at 400-degrees-
C with 10 W of rf bias had a small stress and showed almost theoretica
l behavior in a torque measurement. The difference in the in-plane ani
sotropy energy between the film and bulk was attributed to the effect
of uniaxial anisotropy energy.