POTENTIAL NEAR THE INTERFACE OF GAAS (AL,GA)AS IN THE JELLIUM,THOMAS MODEL/

Authors
Citation
Dr. Su et Yh. Wen, POTENTIAL NEAR THE INTERFACE OF GAAS (AL,GA)AS IN THE JELLIUM,THOMAS MODEL/, Zhongguo wuli xuekan, 31(4), 1993, pp. 537-554
Citations number
34
Categorie Soggetti
Physics
Journal title
ISSN journal
05779073
Volume
31
Issue
4
Year of publication
1993
Pages
537 - 554
Database
ISI
SICI code
0577-9073(1993)31:4<537:PNTIOG>2.0.ZU;2-B
Abstract
Thomas-Fermi model is applied to study the heterostructure GaAs/(Al,Ga )As p-N junction. We consider that the electron and hole densities are embeded in the heterojellium of constant charge background and solve the Poission equations of electron and hole separately on the p-side a nd on the N-side. We derive and calculate some semiconductor's propert ies, such as space charge layer width, depletion layer width, electron and hole density distributions, potentials. We find that our results confirm all the concepts we have currently, especially from the electr omagnetism point of view. There are also a ''quantum well'' to be used for (quantum) dynamical calculations. At the interface, we have also find the spike. But the magnitudes of the layer widths are different f rom those of the current concepts.