THE PREPARATION AND GROWTH OF COLLOIDAL PARTICLES OF CONCENTRATED SILICA SOLS

Citation
Hc. Liu et al., THE PREPARATION AND GROWTH OF COLLOIDAL PARTICLES OF CONCENTRATED SILICA SOLS, Colloids and surfaces. A, Physicochemical and engineering aspects, 74(1), 1993, pp. 7-13
Citations number
6
Categorie Soggetti
Chemistry Physical
ISSN journal
09277757
Volume
74
Issue
1
Year of publication
1993
Pages
7 - 13
Database
ISI
SICI code
0927-7757(1993)74:1<7:TPAGOC>2.0.ZU;2-Y
Abstract
Concentrated acidic (pH 3-4) and basic (pH 9-10) silica sols (30-40 wt .%, particle diameter D = 10-20 nm) have been prepared from water-glas s. Both products are very stable in the presence of an appropriate amo unt of stabilizer. It is suggested that the growth of SiO2 particles i n basic solution proceeds by the reaction of neutral surface silanol g roups with monosilicic acid anions, and of surface Si-O- groups with m onosilicic acid molecules. The rate of growth of the colloidal particl es can be described by the following equation, in good agreement with experimental results: V(D) = K(D) 10(-865/T) (r2 + 56.4rD - 126D2)(r 30 + 5D)/D6r(r2 + 126D2) where K(D) is the rate constant, D is the di ameter of colloidal particles, r is the SiO2/Na2O mole ratio and T is the temperature in kelvins.