THERMAL-DIFFUSIVITY OF SILICA GLASS AT PRESSURES UP TO 9-GPA

Authors
Citation
T. Katsura, THERMAL-DIFFUSIVITY OF SILICA GLASS AT PRESSURES UP TO 9-GPA, Physics and chemistry of minerals, 20(3), 1993, pp. 201-208
Citations number
22
Categorie Soggetti
Psychology
ISSN journal
03421791
Volume
20
Issue
3
Year of publication
1993
Pages
201 - 208
Database
ISI
SICI code
0342-1791(1993)20:3<201:TOSGAP>2.0.ZU;2-L
Abstract
The thermal diffusivity of silica glass was measured at pressures up t o 9 GPa and temperatures up to 1200 K. The measurements involve adopti ng the Angstrom method to a cylindrical geometry in a uniaxial split-s phere apparatus. This method can be used to determine thermal diffusiv ity in samples with dominant conductive heat transfer. The thermal dif fusivity of silica glass has a negative first pressure derivative but a positive second pressure derivative. Although the elastic moduli hav e minima near 3 GPa, the thermal diffusivity does not has minimum up t o 9 GPa, which cannot be explained by the model of Kittel (1949). The negative pressure derivative of thermal diffusivity is a feature proba bly unique in silica glass, and its magnitude should decrease with the addition of Na2O.