DIAMOND NUCLEATION ON EPITAXIALLY GROWN Y-ZRO2 LAYERS ON SI(100)

Citation
Sm. Kanetkar et al., DIAMOND NUCLEATION ON EPITAXIALLY GROWN Y-ZRO2 LAYERS ON SI(100), Applied physics letters, 63(6), 1993, pp. 740-742
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
63
Issue
6
Year of publication
1993
Pages
740 - 742
Database
ISI
SICI code
0003-6951(1993)63:6<740:DNOEGY>2.0.ZU;2-P
Abstract
Enhanced nucleation of polycrystalline diamond has been achieved on Si (100) with an epitaxial intermediate layer of yttria stabilized zircon ia (Y-ZrO2). The epitaxial Y-ZrO2 layer was grown by pulsed excimer la ser ablation and the diamond deposition was accomplished using the hot filament chemical vapor deposition method. The morphological, structu ral, and defect properties of the diamond crystallites are studied usi ng the techniques of scanning electron microscopy, x-ray diffraction, and laser Raman spectroscopy, respectively.