SEGREGATION OF SI DELTA-DOPING IN GAAS-ALGAAS QUANTUM-WELLS AND THE CAUSE OF THE ASYMMETRY IN THE CURRENT-VOLTAGE CHARACTERISTICS OF INTERSUBBAND INFRARED DETECTORS
Hc. Liu et al., SEGREGATION OF SI DELTA-DOPING IN GAAS-ALGAAS QUANTUM-WELLS AND THE CAUSE OF THE ASYMMETRY IN THE CURRENT-VOLTAGE CHARACTERISTICS OF INTERSUBBAND INFRARED DETECTORS, Applied physics letters, 63(6), 1993, pp. 761-763
Dopant segregation in the well region of a multiple quantum well inter
subband photodetector can cause an asymmetry in the observed forward a
nd reverse current-voltage characteristics. We compensate for the segr
egation by shifting the position of the Si delta doping in the well an
d model the effect with good agreement for a range of shift values. Fo
r samples grown at a substrate temperature of 605-degrees-C, we find t
hat the observed behavior is best described by assuming that the Si de
lta-doping profile smears in the growth direction resulting in an asym
metric broadening of about 27 angstrom.