CH3OH CONCENTRATION AND TOTAL PRESSURE-DEPENDENCE OF DIAMOND FILMS FORMED FROM CH3OH-H2 MIXED-GAS BY MAGNET-ACTIVE MICROWAVE PLASMA CHEMICAL-VAPOR-DEPOSITION

Diamond films were deposited by a magnetic-field-assisted microwave pl asma from CH3OH-H-2 mixed gas at the pressure range from 0.1 Torr to 0 .5 Torr and a CH3OH concentration of 17-100%. CH3OH concentration and total pressure dependence of the diamond films were examined. We obser ved that the deposition rate decreased and the quality of diamond film s improved as the total pressure and the CH3OH concentration increased . Secondary ion mass spectroscopic analysis showed that the diamond fi lms contain hydrogen in a concentration greater than 5 x 10(19) cm-3. It Was observed from Raman spectra that the quality of diamond films i s related to the hydrogen content of the diamond films. From the resul ts of optical emission spectra, it was found that OH radical is relate d to the quality of the diamond films.