Methods are proposed for preparing a standard reference material (SRM)
for ion implantation. This would provide a reliable means for certify
ing and calibrating equipment and measurement tools. The SRM would be
a wafer implanted with a specified species, energy, and dose, and its
average sheet resistance and uniformity would be specified within cert
ain tolerances. The proposed standard represents the work of a number
of collaborating organizations, which reviewed existing studies and al
so considered input from implant vendors and service organizations. Fa
brication specifications are proposed along with plots indicating sens
itivity of key results to various critical parameters of that process.