DEPOSITION OF ME C-H COATINGS FROM METAL-ORGANIC PRECURSORS USING A PLASMA-ACTIVATED RF PROCESS

We developed a laboratory system for the deposition of metal-carbon (M e-C: H) hard coatings from a volatile metal organic compound using an r.f.-plasma-activated process. This technique allows Me-C: H film depo sition onto the negatively biased cathode with a bombardment of the gr owing film by high energy ions. Information about the ferrocene plasma process was gained from the mass analysis of the exhaust using a diff erentially pumped quadrupole mass spectrometer. The deposited films we re analysed using X-ray-induced photoelectron spectroscopy (XPS). Thes e measurements indicate a dependence of the Fe-C: H film composition a s well as the microstructure on the self-bias voltage. The deconvoluti on of the C 1s XPS spectra indicates the presence of iron carbide clus ters within an amorphous C: H matrix.