ON AN INFLUATION OF DIFFERENT EPITAXIAL R EGIMES ON FILM STRUCTURE

Citation
Tc. Mamedov et al., ON AN INFLUATION OF DIFFERENT EPITAXIAL R EGIMES ON FILM STRUCTURE, Kvantovaa elektronika, 20(7), 1993, pp. 714-720
Citations number
11
Categorie Soggetti
Physics, Applied","Engineering, Eletrical & Electronic
Journal title
ISSN journal
03687147
Volume
20
Issue
7
Year of publication
1993
Pages
714 - 720
Database
ISI
SICI code
0368-7147(1993)20:7<714:OAIODE>2.0.ZU;2-9
Abstract
An influence is studied of electromagnetic radiation on epitaxial stru cture growing processes. Highpower xenon lamp, pulse and continuouse U V laser were used in experiments on A B-4(6) films growing. The condit ions of obtainind of nonplanar film structures are detemined. Properti es of filmes doped with indium, including transient layer between the film and the substrate are studied, as well as film peeling processes. The model of processes going on the crystallization surface is consid ered and the necessity to take defects kinetics into account when anal izing photostymulated epitaxy is shown.