NACL-TYPE OXIDE-FILMS PREPARED BY PLASMA-ENHANCED METALORGANIC CHEMICAL-VAPOR-DEPOSITION

Thin films of MgO, NiO and CoO with NaCl-type structure were prepared by plasma-enhanced metalorganic chemical vapor deposition using metal acetylacetonato complexes as source materials. Soda-lime glass, Si(111 ), stainless steel and fused silica were used as the substrates. X-ray diffraction patterns indicated that (100) preferred-orientation NaCl- type oxide films were obtained at substrate temperatures of 150-degree s-C or above, independent of the kind of substrate. Scanning electron microscopy images showed that each film had a smooth surface and a col umnar structure with growth perpendicular to the film surface.