We have fabricated quantum well wire structures by using electron beam
lithography and reactive ion etching techniques on (Zn,Cd)Se/Zn(S,Se)
multiple quantum well structures. Photoluminescence efficiencies have
been studied as a function of the wire width (down to about 400 angst
rom), and temperature. The results indicate that the sidewall surfaces
exposed during the dry etching play an important role in providing no
nradiative centers for the optically injected carriers, strongly dimin
ishing the radiative efficiencies in the smallest structures.