DEPOSITION OF TITANIUM-BASED FILMS BY LASER-ASSISTED THERMAL CVD OF TITANIUM TETRACHLORIDE

Authors
ALEXANDRESCU R CIREASA R DRAGNEA B MORJAN I VOICU I ANDREI A
Citation
R. Alexandrescu et al., DEPOSITION OF TITANIUM-BASED FILMS BY LASER-ASSISTED THERMAL CVD OF TITANIUM TETRACHLORIDE, Journal de physique. IV, 3(C3), 1993, pp. 265-272
Citations number
13
Categorie Soggetti
Physics
Journal title
Journal de physique. IV → ACNP
ISSN journal
11554339
Volume
3
Issue
C3
Year of publication
1993
Pages
265 - 272
Database
ISI
SICI code
1155-4339(1993)3:C3<265:DOTFBL>2.0.ZU;2-O
Abstract
The results of a study of laser-assisted CVD of thin titanium films fr om TiCl4 using a CO2 laser are pesented. The Ti-based layers deposited onto quartz substrates were investigated by XPS technics. The influen ce of the incident laser energy on the chemical content of films as we ll as on the film growth rate was pointed out. The experimental result s indicate that, on quartz substrate a multilayer structure is formed with unsaturated TiSi(x) at the interface and oxidized phases at the s urface.