EFFECT OF CVD PROCESS PARAMETERS ON PHASE AND CHEMICAL-COMPOSITION OFBSCCO THIN-FILMS

Citation
Vn. Fuflyigin et al., EFFECT OF CVD PROCESS PARAMETERS ON PHASE AND CHEMICAL-COMPOSITION OFBSCCO THIN-FILMS, Journal de physique. IV, 3(C3), 1993, pp. 361-366
Citations number
13
Categorie Soggetti
Physics
Journal title
ISSN journal
11554339
Volume
3
Issue
C3
Year of publication
1993
Pages
361 - 366
Database
ISI
SICI code
1155-4339(1993)3:C3<361:EOCPPO>2.0.ZU;2-R
Abstract
Superconducting BSCCO thin films were obtained with high deposition ra te (about 35 nm/min) at temperatures of 720-810-degrees-C by MOCVD-tec hnique. Characteristics of evaporation process of precursors were dete rmined. The influence of deposition temperature and oxygen partial pre ssure on superconducting phase formation and chemical composition of t he films was studied.