CHEMICAL-VAPOR-DEPOSITION OF AL2O3 ON TITANIUM-OXIDES

The morphology of chemically vapour deposited alpha-Al2O3, developed o n different titanium oxides, was studied. Ti2O3, Ti3O5 and TiO2 were u sed as substrate materials. The titanium oxides and the alpha-Al2O3 we re grown by the TiCl4/H-2/CO2 and the AlCl3/H-2/CO2 processes, respect ively, usually at 1000-degrees-C and 6.7x10(3) Pa. No considerable dif ference in morphology of alpha-Al2O3 on the different titanium oxides were obtained. The alpha-AlO3 grains were larger on Ti2O3 than on Ti3O 5 and TiO2.