CHEMICAL-VAPOR-DEPOSITION OF PYROLYTIC CARBON ON POLISHED SUBSTRATES

Citation
Jf. Despres et al., CHEMICAL-VAPOR-DEPOSITION OF PYROLYTIC CARBON ON POLISHED SUBSTRATES, Journal de physique. IV, 3(C3), 1993, pp. 563-570
Citations number
11
Categorie Soggetti
Physics
Journal title
ISSN journal
11554339
Volume
3
Issue
C3
Year of publication
1993
Pages
563 - 570
Database
ISI
SICI code
1155-4339(1993)3:C3<563:COPCOP>2.0.ZU;2-C
Abstract
Pyrolytic carbon thin (4-100 nm) films were obtained from methane in a hot wall reactor on optically polished inert substrates by varying th e deposition time and temperature. They were characterized by all mode s of TEM. They are composed in majority of lamellar pyrocarbon whose t hickness and disorder increases with increasing temperature. Isotropic carbon islands are also observed at the upper surface of the film.