NEUTRON REFLECTOMETRY CHARACTERIZATION OF INTERFACE WIDTH BETWEEN SOL-GEL TITANIUM-DIOXIDE AND SILICON DIOXIDE THIN-FILMS

Neutron reflectometry (NR) was used to directly measure the interface width between a titanium dioxide and a silicon dioxide film deposited by sol-gel processing. In a bilayer heated to 450-degrees-C, NR measur ements showed that the interface width is 0.8 nm. This width is the sa me as the roughness of a sol-gel silicon dioxide surface after the sam e heat treatment, suggesting no interdiffusion or mixing at the bilaye r interface.