J. Pola et al., SI C/F/H MATERIALS FROM LASER-EXPLOSIVE DECOMPOSITION OF FLUOROMETHYLSILANES/, Applied organometallic chemistry, 7(6), 1993, pp. 381-389
Solid Si/C/H/F materials laser-deposited from gaseous fluoro-methylsil
anes are examined by XPS, SEM, IR and Raman spectroscopy and revealed
to be a blend of silicon-carbon-based frameworks, possessing some Si-H
and C-H bonds, and carbon whose modification is dependent on the stru
cture of the parent fluoromethylsilane. Their properties are affected
by contact with the atmosphere: although incorporation of oxygen into
silicon-carbon frameworks is a very fast process, the dramatically imp
roved adhesion to aluminium requires long exposure periods.