SI C/F/H MATERIALS FROM LASER-EXPLOSIVE DECOMPOSITION OF FLUOROMETHYLSILANES/

Citation
J. Pola et al., SI C/F/H MATERIALS FROM LASER-EXPLOSIVE DECOMPOSITION OF FLUOROMETHYLSILANES/, Applied organometallic chemistry, 7(6), 1993, pp. 381-389
Citations number
44
Categorie Soggetti
Chemistry Applied","Chemistry Inorganic & Nuclear
ISSN journal
02682605
Volume
7
Issue
6
Year of publication
1993
Pages
381 - 389
Database
ISI
SICI code
0268-2605(1993)7:6<381:SCMFLD>2.0.ZU;2-Q
Abstract
Solid Si/C/H/F materials laser-deposited from gaseous fluoro-methylsil anes are examined by XPS, SEM, IR and Raman spectroscopy and revealed to be a blend of silicon-carbon-based frameworks, possessing some Si-H and C-H bonds, and carbon whose modification is dependent on the stru cture of the parent fluoromethylsilane. Their properties are affected by contact with the atmosphere: although incorporation of oxygen into silicon-carbon frameworks is a very fast process, the dramatically imp roved adhesion to aluminium requires long exposure periods.