F. Tiberg et al., INTERFACIAL BEHAVIOR OF NONIONIC SURFACTANTS AT THE SILICA WATER INTERFACE REVEALED BY ELLIPSOMETRY, Thin solid films, 234(1-2), 1993, pp. 478-481
This work reports a new approach for in situ studies of thin adsorbed
films (less than 100 angstrom) on layered substrates by null ellipsome
try. The values of the adsorbed film properties are obtained by first
characterizing the substrate in different ambient media, having differ
ent refractive indices. These data are then used to apply the appropri
ate optical model for interpreting the adsorption data. We show that i
t is possible by this approach to make rather accurate and time-resolv
ed measurements of the thickness and refractive index of thin adsorbed
layers, in addition to the ordinary output data on the adsorbed amoun
t. Besides the pure methodological part of the work, we also investiga
te the general features of the adsorption of polyethylene glycol monoa
lkyl ethers (C(n)E(m)) at the silica-water interface. The results feat
uring a series of surfactants with varying compositions confirm the co
operative nature of the adsorption process at the silica-water interfa
ce. This involves the formation of interfacial aggregates, with well-d
efined extensions normal to the surface, at a critical concentration.