LASER-FOCUSED ATOMIC DEPOSITION

Citation
Jj. Mcclelland et al., LASER-FOCUSED ATOMIC DEPOSITION, Science, 262(5135), 1993, pp. 877-880
Citations number
14
Categorie Soggetti
Multidisciplinary Sciences
Journal title
ISSN journal
00368075
Volume
262
Issue
5135
Year of publication
1993
Pages
877 - 880
Database
ISI
SICI code
0036-8075(1993)262:5135<877:LAD>2.0.ZU;2-N
Abstract
The ability to fabricate nanometer-sized structures that are stable in air has the potential to contribute significantly to the advancement of new nanotechnologies and our understanding of nanoscale systems. La ser light can be used to control the motion of atoms on a nanoscopic s cale. Chromium atoms were focused by a standing-wave laser field as th ey deposited onto a silicon substrate. The resulting nanostructure con sisted of a series of narrow lines covering 0.4 millimeter by 1 millim eter. Atomic force microscopy measurements showed a line width of 65 /- 6 nanometers, a spacing of 212.78 nanometers, and a height of 34 +/ - 10 nanometers. The observed line widths and shapes are compared with the predictions of a semiclassical atom optical model.