Cs. Cui et Rw. Boswell, ROLE OF EXCITATION-FREQUENCY IN A LOW-PRESSURE, INDUCTIVELY-COUPLED RADIOFREQUENCY, MAGNETIZED PLASMA, Applied physics letters, 63(17), 1993, pp. 2330-2332
We have experimentally studied the role of the excitation frequency f(
rf) in a low-pressure, inductively coupled radio-frequency (rf), magne
tized plasma. Planar Langmuir probe measurements of the electron energ
y distribution function and the plasma density n(e) clearly demonstrat
e a sudden change in the nature of plasma-rf coupling as f(rf) approac
hes the electron cyclotron frequency f(ce) from below or above. The ob
served mode change is qualitatively explained by different wave coupli
ng mechanism for f(rf) < f(ce) and f(rf) > f(ce). These observations c
ould have important applications for plasma processing.