EFFECT OF THE CONCENTRATION OF NITROGEN ON THE MICROSTRUCTURE AND DARK CONDUCTIVITY OF A-SI1-XNX-H FILMS

Authors
BUDAGYAN BG AIVAZOV AA SAZONOV AY
Citation
Bg. Budagyan et al., EFFECT OF THE CONCENTRATION OF NITROGEN ON THE MICROSTRUCTURE AND DARK CONDUCTIVITY OF A-SI1-XNX-H FILMS, Semiconductors, 27(8), 1993, pp. 754-756
Citations number
11
Categorie Soggetti
Physics, Condensed Matter
Journal title
Semiconductors → ACNP
ISSN journal
10637826
Volume
27
Issue
8
Year of publication
1993
Pages
754 - 756
Database
ISI
SICI code
1063-7826(1993)27:8<754:EOTCON>2.0.ZU;2-4