Zh. Liu et al., EVALUATION OF THE GROWTH-BEHAVIOR OF GOLD FILM SURFACES EVAPORATION-DEPOSITED ON MICA UNDER DIFFERENT CONDITIONS, Journal of physics. Condensed matter, 9(1), 1997, pp. 59-71
A systematic AFM study of gold films deposited on mica substrates unde
r a range of selected conditions reveals the evolution of the surface
morphology of the films as a function of growth temperature, film thic
kness, and deposition rate. Scaling analysis shows that the growth beh
aviour of the surfaces of these films can be considered as self-affine
fractals. The observed topography follows island-type (3D) growth pro
cesses in the majority of cases with a roughness exponent, alpha, in t
he range 0.24-0.75, or quasi-2D island growth in the remainder with al
pha = 1.19 or 1.45. In the latter cases, however, the two gold films g
rown under the particular conditions used reflect typical growth model
s expressing a high roughness exponent, well consistent with theoretic
al prediction.