EVALUATION OF THE GROWTH-BEHAVIOR OF GOLD FILM SURFACES EVAPORATION-DEPOSITED ON MICA UNDER DIFFERENT CONDITIONS

Citation
Zh. Liu et al., EVALUATION OF THE GROWTH-BEHAVIOR OF GOLD FILM SURFACES EVAPORATION-DEPOSITED ON MICA UNDER DIFFERENT CONDITIONS, Journal of physics. Condensed matter, 9(1), 1997, pp. 59-71
Citations number
35
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
09538984
Volume
9
Issue
1
Year of publication
1997
Pages
59 - 71
Database
ISI
SICI code
0953-8984(1997)9:1<59:EOTGOG>2.0.ZU;2-J
Abstract
A systematic AFM study of gold films deposited on mica substrates unde r a range of selected conditions reveals the evolution of the surface morphology of the films as a function of growth temperature, film thic kness, and deposition rate. Scaling analysis shows that the growth beh aviour of the surfaces of these films can be considered as self-affine fractals. The observed topography follows island-type (3D) growth pro cesses in the majority of cases with a roughness exponent, alpha, in t he range 0.24-0.75, or quasi-2D island growth in the remainder with al pha = 1.19 or 1.45. In the latter cases, however, the two gold films g rown under the particular conditions used reflect typical growth model s expressing a high roughness exponent, well consistent with theoretic al prediction.