An electric field induced electron tunneling emission from deep traps
and an energy distribution of trap levels in VLSI grade SiO2 layers ha
ve been studied using a new isochronal - EFSE - technique. A broad spe
ctrum with a density of trap states peak at about 1.9 eV was observed
for the first time. The experiment proved the importance of an electro
n trap-to-band tunneling emission in SiO2