Yh. Hu et Sw. Pan, SAPOSM - AN OPTIMIZATION METHOD APPLIED TO PARAMETER EXTRACTION OF MOSFET MODELS, IEEE transactions on computer-aided design of integrated circuits and systems, 12(10), 1993, pp. 1481-1487
In this paper we present a novel optimization program called SaPOSM, a
nd its applications to the MOSFET model parameter extraction problems.
SaPOSM integrates an efficient deterministic optimization algorithm,
called POSM, with the popular stochastic optimization paradigm simulat
ed annealing (SA). It offers great promise for improving the optimizat
ion results significantly while using only a moderate amount of comput
ing time. Tested on a suite of multi-minima optimization benchmark pro
blems, SaPOSM's performance rivals a recently reported fast simulated
diffusion method. We used SaPOSM to extract the parameters of state-of
-the-art submicron (0.3-mum channel length) MOSFET transistors, and ha
ve obtained very favorable results. For a second difficult parameter e
xtraction problem (18 parameters, five different channel lengths), sim
ulation results indicate that SaPOSM achieves performance comparable t
o the SA method. Specifically, both SA and SaPOSM are able to minimize
the modeling error to several orders of magnitude small than that obt
ained using POSM alone. At the same time, the computing time taken by
SaPOSM is only a very small fraction of that taken by the SA method.