Physical and chemical properties of Cu/Te/CdTe structures are studied
by means of both grazing incidence X-ray diffraction and XPS technique
s. Structural analysis shows that an interfacial reaction occurs betwe
en Cu and Te layers leading to the formation of the stoichiometric Cu2
Te compound. The contact resistivity has been analyzed on the basis of
Mott's model and taking into account the disordered nature of the Cu/
Te structure as well as the formed interfaces.