X-RAY-DIFFRACTION FROM LOW-DIMENSIONAL STRUCTURES

Authors
Citation
Pf. Fewster, X-RAY-DIFFRACTION FROM LOW-DIMENSIONAL STRUCTURES, Semiconductor science and technology, 8(11), 1993, pp. 1915-1934
Citations number
122
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
8
Issue
11
Year of publication
1993
Pages
1915 - 1934
Database
ISI
SICI code
0268-1242(1993)8:11<1915:XFLS>2.0.ZU;2-M
Abstract
This review paper presents the applications of x-ray diffraction to ro utine measurements and the procedures for extending its capabilities o f analysis to undertake a detailed structural investigation of low-dim ensional structures. The uses and limitations of the familiar double-c rystal diffractometer are discussed as are the advantages of 'reciproc al space mapping' with a multiple-crystal diffractometer. In general x -ray diffraction has been used for composition and thickness measureme nt in low-dimensional structures (LDS) and these aspects are covered, as well as the avoidance of the pitfalls associated with their determi nation. The possibilities for the use of x-ray diffraction methods to determine interface quality, the evolution of lattice relaxation, the detailed microstructure, etc, are discussed, with an indication of the limits of the techniques.