We have studied unintentionally and deliberately Si- or Mg-doped indir
ect-gap AlxGa1-xAs (0.38 less-than-or-equal-to x less-than-or-equal-to
0.835) prepared by a variety of growth techniques, by means of photol
uminescence in the temperature range 4.2 K less-than-or-equal-to T les
s-than-or-equal-to 300 K. At 4.2 K two high-energy transitions were de
termined to be due to the radiative decay of donor and acceptor bound
excitons. The zero-phonon bound exciton transitions are accompanied by
phonon replicas due to the emission of one or two AlAs- or GaAs-like
phonons. The peak energy of the indirect donor bound exciton increases
in the range 0 less-than-or-equal-to x less-than-or-equal-to 1 corres
ponding to the relation (T less-than-or-equal-to 30 K) hv(c)(D0X, x) =
1.9690 + 0.1975x + 0.0517x7.4 (in eV). The Al content was determined
by electron beam microanalysis using different standards. The donor bo
und exciton binding energy was estimated using the intensity quenching
versus the temperature. Including these values the indirect gap-compo
sition relation is given. The direct-indirect crossover point was dete
rmined in excellent agreement with earlier estimations. Besides the ra
diative decay of bound excitons free exciton recombination was observe
d at elevated temperatures.