IMPROVED STRUCTURE FOR OPTIMIZATION OF FOCUS AND EXPOSURE FOR IC PRODUCTION

Authors
WALTON AJ FALLON M STEVENSON JTM ROSS AWS REEVES CM
Citation
Aj. Walton et al., IMPROVED STRUCTURE FOR OPTIMIZATION OF FOCUS AND EXPOSURE FOR IC PRODUCTION, Electronics Letters, 29(17), 1993, pp. 1573-1574
Citations number
1
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
Electronics Letters → ACNP
ISSN journal
00135194
Volume
29
Issue
17
Year of publication
1993
Pages
1573 - 1574
Database
ISI
SICI code
0013-5194(1993)29:17<1573:ISFOOF>2.0.ZU;2-3
Abstract
A test structure that can be used for optimising the focus and exposur e of wafer steppers is presented. It consists of a single layer of pol ysilicon which lends itself to automatic electrical measurement and do es not suffer from the apex height reduction which occurs with the pre viously reported Gaudi structure.