DIFFERENT SPUTTERING METHODS FOR THE DEPOSITION OF HIGH-T(C) SUPERCONDUCTING THIN-FILMS

Authors
STEINBEISS E BRUCHLOS H EICK T MANZEL M MICHALKE W SCHULER T STEENBECK K
Citation
E. Steinbeiss et al., DIFFERENT SPUTTERING METHODS FOR THE DEPOSITION OF HIGH-T(C) SUPERCONDUCTING THIN-FILMS, Vacuum, 44(11-12), 1993, pp. 1113-1117
Citations number
8
Categorie Soggetti
Physics, Applied
Journal title
Vacuum → ACNP
ISSN journal
0042207X
Volume
44
Issue
11-12
Year of publication
1993
Pages
1113 - 1117
Database
ISI
SICI code
0042-207X(1993)44:11-12<1113:DSMFTD>2.0.ZU;2-3
Abstract
The deposition of high-T(c) superconducting thin films by magnetron sp uttering of ceramic and alloy targets is strongly influenced by the bo mbardment of energetic oxygen particles generated and accelerated at t he target surface. In this paper we examine different sputtering metho ds to overcome the disturbing effects of these energetic particles on the composition of the deposited films.