Ps. Murty et al., EXCITATION TEMPERATURE AND ELECTRON NUMBER DENSITY-MEASUREMENTS IN ANINDUCTIVELY-COUPLED PLASMA SOURCE, Indian Journal of Pure & Applied Physics, 31(11), 1993, pp. 804-807
Using spectroscopic techniques, excitation temperature and electron nu
mber density were determined for an inductively coupled plasma source
operated at a frequency of 56 MHz and 1.5 kW forward power. The excita
tion temperature showed a difference of 800 K when measured by employi
ng two different methods. This could be attributed to the non-LTE natu
re of the plasma source.