EXCITATION TEMPERATURE AND ELECTRON NUMBER DENSITY-MEASUREMENTS IN ANINDUCTIVELY-COUPLED PLASMA SOURCE

Using spectroscopic techniques, excitation temperature and electron nu mber density were determined for an inductively coupled plasma source operated at a frequency of 56 MHz and 1.5 kW forward power. The excita tion temperature showed a difference of 800 K when measured by employi ng two different methods. This could be attributed to the non-LTE natu re of the plasma source.