DILUTE NIPT ALLOY INTERACTIONS WITH SI

The reaction between a dilute Ni95Pt5 alloy and [111]Si has been inves tigated as a function of the annealing temperature and time, and the f ilm thickness. Contrary to the concentrate alloys the first phase form ed is Ni2Si and the growth kinetics in the initial steps are similar t o the case of pure Ni. Pt segregates in the alloy and its presence slo ws down the silicide growth rate suggesting that a new mechanism, name ly the release of Ni from the alloy, is competing with the diffusion p rocess in the silicide. In all the cases here considered NiSi starts t o form only when an the Ni is reacted, indicating that the Pt never re aches high enough concentrations to inhibit the Ni2Si growth. The furt her evolution of the system is similar to the ones reported for bilaye rs and non-dilute alloys. The I-V characteristics measured after annea ling give a barrier height of 0.70+/-0.01 eV.