SIMULATION OF LIGHT-SCATTERING BY A PARTICLE ON A FILM-COATED SUBSTRATE USING COUPLED-DIPOLE METHOD

The intensity of light scattered by a submicron particle on a film-coa ted semiconductor substrate is calculated as a function of the thickne ss of the film using the coupled dipole method. The result of calculat ion reproduces the experimentally observed features, i.e., the oscilla tory dependence of the scattering intensity on the thickness and the e nhancement of the scattering intensity for very thin films. The enhanc ement is reproduced only when the dipole-dipole interaction between th e particle and the substrate is included in the calculation. Using the method we propose, the scattering intensity can be calculated for an arbitrary size and shape of particle on an arbitrary thickness of film .