PHOTOLITHOGRAPHY OF AMORPHOUS FILMS OF (ETA(5)-C5H5)2TI(N3)2 ON SILICON(111) RESULTING IN TIO2 - THE MECHANISM OF THE PHOTODEPOSITION REACTION

Photolithography to produce TiO2 patterns from amorphous films of (eta 5-C5H5)2Ti(N3)2 has been demonstrated. The efficiency of the reaction has been measured yielding a quantum yield of 0.025. The mechanism of the photoreactions of (eta5-C5H5)2Ti(N3)2 has been studied using Fouri er transform-infrared spectroscopy in both a low-temperature 1,2-epoxy ethylbenzene glass and as surface films. In each case the primary phot ochemical process was found to be loss of a single azido group. The re sult of subsequent photolysis was found to be dependent upon medium an d temperature. In the low-temperature glass no further photochemistry was observed. The exhaustive photolysis of films at 20 K, or room temp erature, under a vacuum or in air led to loss of all ligands and the f ormation of TiO2.