THE INITIAL PHOTOCHEMICAL PROCESS OF TRIOSMIUMDODECACARBONYL ADSORBEDON THE SURFACE OF SILICA AS STUDIED BY PICOSECOND DIFFUSE-REFLECTANCELASER PHOTOLYSIS AND MATRIX-ISOLATION

Citation
S. Yamamoto et al., THE INITIAL PHOTOCHEMICAL PROCESS OF TRIOSMIUMDODECACARBONYL ADSORBEDON THE SURFACE OF SILICA AS STUDIED BY PICOSECOND DIFFUSE-REFLECTANCELASER PHOTOLYSIS AND MATRIX-ISOLATION, Chemical physics letters, 215(4), 1993, pp. 323-328
Citations number
32
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
ISSN journal
00092614
Volume
215
Issue
4
Year of publication
1993
Pages
323 - 328
Database
ISI
SICI code
0009-2614(1993)215:4<323:TIPPOT>2.0.ZU;2-X
Abstract
The transient absorption spectrum of the coordinatively unsaturated tr inuclear osmium carbonyl cluster Os-3(CO)(11) adsorbed on the surface of silica was observed for the first time by the ps time-resolved diff use reflectance laser photolysis of Os-3(CO)(12). The present results demonstrated that Os-3(CO)(11) is the photoprimary product responsible for the net oxidative addition of surface hydroxyls to Os-3(CO)(12) a dsorbed on the surface of silica to form the surface attached trinucle ar species HOs3(CO)(10)-OSi=. It was revealed that the addition of sur face hydroxyls to Os-3(CO)(11) is completed within the time of our ins trumental response (less than or equal to 35 ps), which is comparable to the coordination of solvent to coordinatively unsaturated metal car bonyls.