THE INITIAL PHOTOCHEMICAL PROCESS OF TRIOSMIUMDODECACARBONYL ADSORBEDON THE SURFACE OF SILICA AS STUDIED BY PICOSECOND DIFFUSE-REFLECTANCELASER PHOTOLYSIS AND MATRIX-ISOLATION
S. Yamamoto et al., THE INITIAL PHOTOCHEMICAL PROCESS OF TRIOSMIUMDODECACARBONYL ADSORBEDON THE SURFACE OF SILICA AS STUDIED BY PICOSECOND DIFFUSE-REFLECTANCELASER PHOTOLYSIS AND MATRIX-ISOLATION, Chemical physics letters, 215(4), 1993, pp. 323-328
The transient absorption spectrum of the coordinatively unsaturated tr
inuclear osmium carbonyl cluster Os-3(CO)(11) adsorbed on the surface
of silica was observed for the first time by the ps time-resolved diff
use reflectance laser photolysis of Os-3(CO)(12). The present results
demonstrated that Os-3(CO)(11) is the photoprimary product responsible
for the net oxidative addition of surface hydroxyls to Os-3(CO)(12) a
dsorbed on the surface of silica to form the surface attached trinucle
ar species HOs3(CO)(10)-OSi=. It was revealed that the addition of sur
face hydroxyls to Os-3(CO)(11) is completed within the time of our ins
trumental response (less than or equal to 35 ps), which is comparable
to the coordination of solvent to coordinatively unsaturated metal car
bonyls.