We demonstrate that GaAs grown by molecular beam epitaxy on silicon ha
s ideal characteristics for THz receiver applications. The lattice mis
match between silicon and GaAs causes a disordered growth of GaAs, red
ucing the carrier lifetime to 1.8 ps. This is similar to the character
istics observed in low temperature grown GaAs. Furthermore, the high r
esistivity silicon substrate has a very low absorption and dispersion
in the far infrared. This makes it an ideal material in THz system app
lications, and we show that a maximum frequency of 5 THz and a sixfold
increase in sensitivity can be obtained using a GaAs-on-silicon based
THz detector.