MEASUREMENT OF TUNNEL JUNCTION RESISTANCE DURING FORMATION

Authors
BARBER WC JOHNSON RT LEE JS LAWS KE BLAND RW
Citation
Wc. Barber et al., MEASUREMENT OF TUNNEL JUNCTION RESISTANCE DURING FORMATION, Journal of low temperature physics, 93(3-4), 1993, pp. 599-604
Citations number
6
Categorie Soggetti
Physics, Applied
Journal title
Journal of low temperature physics → ACNP
ISSN journal
00222291
Volume
93
Issue
3-4
Year of publication
1993
Pages
599 - 604
Database
ISI
SICI code
0022-2291(1993)93:3-4<599:MOTJRD>2.0.ZU;2-O
Abstract
We have measured the characteristics of aluminum tunnel junctions duri ng and immediately after the formation of the junction. This has permi tted us to observe changes in the oxide barrier, in vacuum and in air. By observing the barrier resistance during sputtering, we were able t o diagnose and correct problems due to plasma discharges which were da maging the junctions. We report preliminary results from junctions pas sivated with a silicon nitride cap layer.