AES, XPS and IR studies of silicon-carbon alloys (a-SixC1-x:H), obtain
ed by PECVD (plasma-enhanced chemical vapor deposition), on polypropyl
ene reveal a Si-concentration gradient in the coating thickness whiche
ver the gaseous composition used for the deposition. Furthermore, an a
dhesion zone between the isotactic polypropylene and the thin film is
pointed out. Structural characterizations of this coating on isotactic
polypropylene allow the formation mechanisms to be determined.