Sc. Pan et al., ENHANCEMENT OF BAND-EDGE LUMINESCENCE IN HYDROGENATED STRAINED SI(0.84)GE(0.16) SI QUANTUM-WELLS BY PHOTOCHEMICAL VAPOR-DEPOSITION/, Zhongguo wuli xuekan, 31(6), 1993, pp. 759-765
Well-resolved band-edge luminescence spectra are reported for strained
Si0.84Ge0.16/Si quantum wells grown by ultrahigh-vacuum chemical-vapo
r-deposition at 550-degrees-C. Phonon assisted transitions are also ob
served and the phonon structure of the spectrum is resolved. Blue shif
ting of the peak emission with decreasing well width is found in good
agreement with theoretical calculations. The effects of hydrogenation
using photochemical vapor deposition system are studied and an enhance
ment of the band edge luminescence intensity by a factor of three acco
mpanied with a decrease in the intensity of the peaks coming from latt
ice defects is observed after hydrogenation. These results indicate th
at photochemical vapor deposition system is a useful tool for injectin
g atomic hydrogen into Si1-xGex/Si quantum wells and to enhance the ba
nd edge luminescence as well as to passivate the activity of the defec
ts.